环戊基全取代六元瓜环与钾离子配合物的合成及其结构表征

金属与瓜环的配位化学是瓜环化学的主要研究内容之一.本文主要研究了环戊基全取代六元瓜环(CyP6 Q[6])与K+的配合物的合成,并利用X-射线单晶衍射法对其晶体结构进行了表征.结果表明:K+与CyP6 Q[6]的两个端口配位,形成了分子胶囊结构.相邻的瓜环通过与[ZnCl4]2-的偶极作用,形成平面堆积结构,最后形成三维超分子自组装实体.     

Cr2AlC在氢氟酸溶液中的腐蚀行为研究

通过液相搅拌对铬粉、铝粉和石墨粉进行混料,经无压烧结制备出高纯度的Cr2 AlC粉末,同时研究了制备出的Cr2 AlC粉末在室温搅拌条件下氢氟酸溶液中的反应行为,结果表明,氢氟酸的浓度和反应时间会影响Cr2 AlC腐蚀的过程和最终产物,随着氢氟酸浓度的增加和反应时间的延长,在搅拌辅助下,Cr2 AlC逐渐被氢氟酸腐蚀,生成CrF3·3H2 O,其形貌也由Cr2 AlC的层状结构转变成疏松结构的纳米颗粒,而腐蚀过程中没有搅拌辅助时,反应产物为Al2 O3和Cr7 C3.     

Lamb波频域逆散射全聚焦成像方法研究

Lamb波因其传播距离远、衰减小常被用于板状结构的无损检测中,在基于Lamb波损伤检测的诸多成像技术中,全聚焦方法(Total Focus Method,TFM)方法因其成像分辨率高、信噪比高而受青睐。然而Lamb波的频散效应导致时域延时量不能被准确计算,进而影响传统TFM方法对损伤定位及成像的精度;此外,既有的TFM方法仅以回波幅值作为成像指标,忽略了Lamb波与损伤的相互作用,故而不能通过损伤表面的物理参数增强成像质量。针对这两个问题,本文首先在时域TFM基础上发展了频域TFM,在计算中纳入频散关系以规避频散的影响;其次以包含明确的损伤特征参数--反射率为成像指标,结合频域TFM方法建立损伤逆散射模型,以实现对损伤的准确成像。仿真和实验结果表明:频域逆散射TFM成像方法能够实现对铝板结构中的损伤检测,在工程实践中具有应用价值。     

基于XPS对硫铁矿去除SeO2-3的机理研究

硒是动植物及人体生长必需的十五种微量元素之一，具有清除体内自由基、抗氧化、增强免疫力等功能，但其安全剂量的范围却很窄。利用扫描电子显微镜（SEM）和X射线衍射仪（XRD）对湿法球磨制备的硫铁矿形貌进行了表征。SEM观测发现加乙醇助磨后的硫铁矿为粒径大小较均匀的球形颗粒团聚体，粒径范围在17～200 nm之间，平均粒径138 nm。XRD衍射图谱中的特征峰与FeS₂衍射图谱中各峰位置基本一致，因此判定硫铁矿中主要化学组分为FeS₂，且图谱中基本没有杂峰，表明制备过程中并未混入杂质，样品纯度较高。实验结果表明，该法制备的硫铁矿具有颗粒粒径小、比表面积大、反应活性高等优点。研究中利用X射线光电子能谱仪（XPS）对硫铁矿去除水体中SeO2-₃的机理进行了研究。研究结果表明, （1）在较为广泛的实验pH范围（pH 2.2～11.5），硫铁矿均能有效去除水体中SeO2-₃，去除效率（除pH值7.8以外）均达到90%以上；（2）硫铁矿与SeO2-₃发生反应后，其主要组成元素的XPS特征峰结合能有所减小，表明硫铁矿表面发生了一定化学变化；（3）酸碱环境下硫铁矿去除SeO2-₃的机理不完全相同，酸性环境下，硫铁矿对SeO2-₃的去除是单纯的氧化还原过程，即硫铁矿中被酸活化的S2-₂将SeO2-₃还原为单质Se(0)，并且酸性越强，SeO2-₃去除效果越好；碱性环境下，SeO2-₃的去除过程中氧化还原与络合反应并存，硫铁矿表面有络合态Fe(OH)SeO₃和单质Se(0)两种存在形态，且碱性越强，络合态Fe(OH)SeO₃含量越高。以上研究结果为硫铁矿去除固定水体和土壤中以SeO2-₃为代表的可变价金属阴离子提供重要理论依据和应用基础。     

基于Ni-SnO2纳米颗粒的GS-PUF设计

气敏传感器具有气体识别、探测和监测等功能, 广泛应用于工业生产等领域, 但在泄漏预警时缺乏迅速识别和定位等功能. 本文基于传感器制备工艺偏差分析, 通过对传感器气敏机制的研究, 提出一种基于Ni-SnO2纳米颗粒的气敏传感器物理不可克隆函数(Gas Sensor-Physical Unclonable Function, GS-PUF)设计方案. 该方案利用掺杂Ni元素的方法, 结合静电喷雾沉积技术制备Ni-SnO2气敏传感器, 以获取更加稳定可靠的物理特征值, 然后采集气敏传感器对不同浓度下气体的响应数据, 最后利用随机阻值多位平衡算法比较不同组气敏传感器响应电信号值, 实现PUF数据输出. 制备每组样本可产生128位二进制数据的多组PUF样本, 进行对比实验. 结果表明, 所设计的GS-PUF具有气体泄漏源头识别定位的功能, 且随机性提升至99%, 唯一性达49.80%.     

基于碳化硅衬底的宽禁带半导体外延

宽禁带半导体具备禁带宽度大、电子饱和飘移速度高、击穿场强大等优势,是制备高功率密度、高频率、低损耗电子器件的理想材料。碳化硅(SiC)材料具有热导率高、化学稳定性好、耐高温等优点,在SiC衬底上外延宽禁带半导体材料,对充分发挥宽禁带半导体材料的优势,并提升宽禁带半导体电子器件的性能具有重要意义。得益于SiC衬底质量持续提升及成本不断降低,基于SiC衬底的宽禁带半导体电子市场占比呈现逐年增加的态势。在SiC衬底上外延生长高质量的宽禁带半导体材料是提高宽禁带半导体电子器件性能及可靠性的关键瓶颈。本文综述了近年来国内外研究者们在SiC衬底上外延SiC、氮化镓(GaN)、氧化镓(Ga₂O₃)所取得的研究进展,并展望了SiC衬底上宽禁带半导体外延的发展及应用前景。     

Cu2O/TiO2-Bi2WO6三元复合催化剂的制备及光催化性能研究

采用水热法制备花状Bi2 WO6,并利用超声分散法制备了Cu2 O/TiO2-Bi2 WO6复合光催化剂,通过FESEM、XRD、XPS、FI-IR、UV-vis DRS和PL对光催化剂进行了分析和表征.表征结果证明:花状Bi2 WO6表面负载着碎片状的TiO2和立方体Cu2 O形成Cu2 O/TiO2-Bi2 WO6复合光催化剂;以短链脂肪酸(SCFAs)为牺牲剂,考察复合光催化剂的光催化产生氢气和烷烃的性能.实验结果表明:Cu2 O/TiO2-Bi2 WO6复合光催化剂以乙酸为牺牲剂,主要产氢气和甲烷,降解率高达91.82;;以丙酸为牺牲剂,产物主要是乙烷和丁烷,降解率高达90.70;;以丁酸为牺牲剂,除了氢气,甲烷,乙烷,丙烷,丁烷外,气体产物还含有一定量的戊烷,其降解率高达91.50;.结合反应液中间产物的成分进行检测,由此推断出光催化反应的可能机理.     

The self-assemblies of a newly designed star-shaped molecule end-capped with bromine atoms studied by scanning tunneling microscopy

A new star-shaped molecule StOF-Br_3 containing oligofluorenes and halogen atoms(Bromine) has been synthesized and studied by Scanning Tunneling Microscopy(STM) at the highly oriented pyrolytic graphite(HOPG) surface.We have obtained the high-resolution self-assembled STM images,from which the highly ordered and closely packed non-porous arrangements of the StOF-Br_3 molecular selfassemblies at the heptanoic acid/HOPG surface could be observed.The molecular models and selfassembled StOF-Br_3 architectures have been given in the following text.Besides,we have also figured out the surface free energy by the density functional theory(DFT) calculation,which proved that the halogen...halogen interaction was strong enough to stabilize the ordered molecular self-assemblies.This work verifies the existence of bromine...bromine interactions,and meanwhile provides a kind of effective approach for quickly building ordered molecular nanoarchitectures with large areas and different geometries.     

Lump and interaction solutions to the (3+1)-dimensional Burgers equation

The(3+1)-dimensional Burgers equation, which describes nonlinear waves in turbulence and the interface dynamics,is considered. Two types of semi-rational solutions, namely, the lump–kink solution and the lump–two kinks solution, are constructed from the quadratic function ansatz. Some interesting features of interactions between lumps and other solitons are revealed analytically and shown graphically, such as fusion and fission processes.     

Surface passivation in n-type silicon and its application in silicon drift detector

Based on the surface passivation of n-type silicon in a silicon drift detector(SDD), we propose a new passivation structure of SiO2/Al2O3/SiO2 passivation stacks. Since the SiO2 formed by the nitric-acid-oxidation-of-silicon(NAOS)method has good compactness and simple process, the first layer film is formed by the NAOS method. The Al2O3 film is also introduced into the passivation stacks owing to exceptional advantages such as good interface characteristic and simple process. In addition, for requirements of thickness and deposition temperature, the third layer of the SiO2 film is deposited by plasma enhanced chemical vapor deposition(PECVD). The deposition of the SiO2 film by PECVD is a low-temperature process and has a high deposition rate, which causes little damage to the device and makes the SiO2 film very suitable for serving as the third passivation layer. The passivation approach of stacks can saturate dangling bonds at the interface between stacks and the silicon substrate, and provide positive charge to optimize the field passivation of the n-type substrate.The passivation method ultimately achieves a good combination of chemical and field passivations. Experimental results show that with the passivation structure of SiO2/Al2O3/SiO2, the final minority carrier lifetime reaches 5223 μs at injection of 5×10¹⁵ cm^-3. When it is applied to the passivation of SDD, the leakage current is reduced to the order of nA.